† Corresponding author. E-mail:
‡ Corresponding author. E-mail:
Project supported by the National Basic Research Program of China (Grant No. 2013CB933604), the National Natural Science Foundation of China (Grant No. 51572290), and the Chinese Academy of Sciences (Grant Nos. 1731300500015 and XDB07030100).
Large-area boron nanowire (BNW) films were fabricated on the Si(111) substrate by chemical vapor deposition (CVD). The average diameter of the BNWs is about 20 nm, with lengths of 5–10 μm. Then, graphene-capped boron nanowires (GC-BNWs) were obtained by microwave plasma chemical vapor deposition (MPCVD). Characterization by scanning electron microscopy indicates that few-layer graphene covers the surface of the boron nanowires. Field emission measurements of the BNWs and GC-BNW films show that the GC-BNW films have a lower turn-on electric field than the BNW films.
Because boron has a unique crystal structure and stable physicochemical properties, it is a promising cold-cathode material for the flat field emission devices.[1–4] In the last few decades, different morphology boron one-dimension nanostructures, such as nanowires,[5–7] nanotubes,[8,9] nanocones,[10,11] and nanobelts,[12,13] have been prepared by chemical vapor deposition (CVD) and their field emission (FE) properties have been characterized. However, the surfaces of the boron one-dimensional nanostructure materials tend to form 2–3 nm thick oxide layers, decreasing the conductivity and emission of electrons.[14] Therefore, it is important to cover the surfaces of the boron one-dimension nanostructure materials with conductive materials. It improves the electrical properties, reduces the work function, and improves the field emission performance. Graphene, a single atomic layer of sp2-hybridized carbon atoms having a honeycomb structure, has attracted considerable attention due to its unique electrical and thermal scattering properties.[15–17] Graphene has a high electrical conductivity and a thin edge of atomic layers, so it is considered as a promising material to cover the boron one-dimension nanostructures used in FE devices.[18–20] Graphene capped on the surfaces of the boron one-dimensional nanostructures increases the emission current for field emission displays.
Here, we report the preparation and field emission of graphene covered boron nanowires (BNWs). Large-area BNWs were first synthesized using boron powder and B2O3 powder as the precursors by chemical vapor deposition. Then graphene was deposited on the surface of the BNWs using microwave plasma CVD (MPCVD) in a methane and hydrogen atmosphere. The FE properties of the BNWs and the graphene-capped BNWs (GC-BNWs) were measured. The results of FE indicate that the GC-BNW films have a lower turn-on electric field.
Boron powder (99.99%), B2O3 (99.99%), and carbon powder (99.9%) were purchased from the Beijing Sinopharm Chemical Reagent Co. Argon (99.9%) and H2/Ar (H2, 10 vol.%) were purchased from the Beijing Praxair Application Gas Co., Ltd. Boron powder, B2O3, and carbon powder with the mass ratio of 4:2:1 were mixed together as the precursors.
The BNWs were fabricated by the CVD method used in our previous work.[17] 100 μL 8 nm Fe3O4 hexane solution[21] as the catalyst (20 mg/mL) was dropped on the surface of a Si(111) wafer; then the Si substrate was heated at 100 °C for 60 min to remove the hexane reagent; finally, Fe3O4 nanoparticles were obtained on the surface of the Si substrate. The Si substrate with an Fe3O4 nanoparticle catalyst was placed in an alumina boat, lying in front of the precursors. Then the alumina boat was transferred into a quartz tube in a horizontal tube furnace. After the system was pumped below 10 Pa, 50 sccm 10% H2/Ar mixed gas (volume ratio) was introduced and the system pressure was changed to 1 × 102 Pa. Then the furnace was heated to 1150 °C at a rate of 8 °C/min and the system pressure was maintained at 1 × 104 Pa. The reaction was allowed to continue for 2 h at this temperature. The furnace was cooled down to room temperature at a rate of 8 °C/min. Brown-black products were found on the Si substrate.
The BNWs grown on the Si substrate were transferred into the chamber of a microwave plasma deposition system. The Si substrate with BNWs was placed on the quartz holder of the chamber; then the reaction chamber was pumped down and the system pressure was tuned to 600 Pa, mixed gas of 15 sccm H2 and 30 sccm CH4 was introduced into the reaction chamber while the microwave was injected (microwave power: 80 W) and maintained for 1 min; finally, the microwave and gas were shut down and the sample was cooled down to room temperature. The graphene-capped BNW sample was obtained. The whole preparation process of GC-BNWs is shown in Fig.
The morphology of the BNWs was characterized by field emission scanning electron microscopy (FE-SEM: SFEG, FEI Corp). Measurements of the field emission (FE) properties of the patterned BNWs were performed on a high vacuum FE analysis system (4 × 10− 5 Pa).
Large-area, high-density boron nanowires were fabricated by chemical vapor deposition. Figure
In order to confirm that graphene was capped on the boron nanowires, a GC-BNW sample was characterized using Raman spectroscopy, as shown in Fig.
In order to compare the field emission properties, we measured the turn-on electronic fields of the GC-BNWs and BNW films. The FE measurements were carried out at room temperature in a vacuum with the chamber pressure maintained at 4 × 10− 5 Pa. The NW samples served as the cathodes, and a molybdenum probe (1 mm in diameter) was employed as the anode. The distance between the anode and the cathode was 300 μm.
The field emission properties of the GC-BNWs and BNW films are shown in Fig.
In addition, the GC-BNWs’ FN plots are almost linear, as shown in Fig.
The emission current stability is a parameter to evaluate the FE properties of cathode materials. Figure
Large-area boron nanowire films were first prepared on the Si(111) substrate using boron, boron oxide, and carbon powders as the precursors by chemical vapor deposition. Then graphene-capped boron nanowires were obtained by microwave plasma chemical vapor deposition in CH4 and H2 atmosphere. Characterization by scanning electron microscopy indicates that few-layer graphene covered the boron nanowires. Field emission measurements show that the turn-on electric fields of the BNWs and GC-BNW films were 6.4 V/μm and 7.5 V/μm, respectively.
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